Sfoglia per Autore
Reduced self-heating in Si/SiGe field-effect RF transistors on thin virtual substrates prepared by low-energy plasma-enhanced chemical vapor deposition
2003-01-01 T., Hackbarth; H. J., Herzog; K. H., Hieber; U., Koenig; Bollani, Monica; Chrastina, Daniel; H., VON KAENEL
A 32 GHz MMIC distributed amplifier based on n-channel SiGe MODFETs
2003-01-01 P., Abele; M., Zeuner; I., Kallfass; J., Mueller; H., LABAN HIWILEPO; T., Hackbarth; Chrastina, Daniel; H., VON KAENEL; U., Koenig; H., Schumacher
A 32 GHz MMIC distributed amplifier based on n-channel SiGe MODFETs
2003-01-01 P., Abele; M., Zeuner; Chrastina, Daniel; T., Hackbarth; J., Kallfass; U., Konig; H., Laban Hiwilepo; J., Mueller; H., Schumacher; H., Von Kaenel
High mobility SiGe heterostructures fabricated by low-energy plasma-enhanced chemical vapor deposition
2004-01-01 VON KÄNEL, Hans; Chrastina, Daniel; B., Roessner; Isella, Giovanni; J. P., Hague; Bollani, Monica
Relaxed SiGe heteroepitaxy on Si with very thin buffer layers: experimental LEPECVD indications and an interpretation based on strain-dependent dislocation nature
2004-01-01 A., Marzegalli; F., Montalenti; M., Bollani; Leo, Miglio; Isella, Giovanni; Chrastina, Daniel; H., VON KAENEL
High quality SiGe electronic material grown by low energy plasma enhanced chemical vapour deposition
2004-01-01 Chrastina, Daniel; Isella, Giovanni; B., Roessner; Bollani, Monica; E., Mueller; T., Hackbarth; H., VON KAENEL
Low-energy plasma-enhanced chemical vapor deposition for strained Si and Ge heterostructures and devices
2004-01-01 Isella, Giovanni; Chrastina, Daniel; B., Rossner; T., Hackbarth; H. J., Herzog; U., Konig; VON KÄNEL, Hans
Formation of strain-induced Si-rich and Ge-rich nanowires at misfit dislocations in SiGe: A model supported by photoluminescence data
2004-01-01 L., Martinelli; A., Marzegalli; P., Raiteri; Bollani, Monica; F., Montalenti; L., Miglio; Chrastina, Daniel; Isella, Giovanni; VON KÄNEL, Hans
Strained Si HFETs for microwave applications: state-of-the-art and further approaches
2004-01-01 M., ENCISO AGUILAR; M., Rodriguez; N., Zerouinian; F., Aniel; T., Hackbarth; H. J., Herzog; U., Koenig; S., Mantl; B., Hollaender; Chrastina, Daniel; Isella, Giovanni; VON KÄNEL, Hans; K., Lyyutovich; M., Oehme
Scattering mechanisms in high-mobility strained-Ge channels
2004-01-01 B., Roessner; Chrastina, Daniel; Isella, Giovanni; H., VON KAENEL
Raman spectroscopy of Si1-xGex epilayers
2005-01-01 G., Bauer; J., Stangl; H., Von Kaenel; E., Wintersberger; Bollani, Monica; Chrastina, Daniel; E., Grilli; M., Guzzi; Isella, Giovanni; L., Martinelli; F., Pezzoli; S., Sanguinetti
Thin relaxed SiGe virtual substrates grown by low-energy plasma-enhanced chemical vapor deposition
2005-01-01 Chrastina, Daniel; Isella, Giovanni; Bollani, Monica; B., Rössner; E., Müller; T., Hackbarth; E., Wintersberger; Z., Zhong; J., Stangl; H., von Känel
LEPECVD - a production technique for SiGe MOSFETs and MODFETs
2005-01-01 Chrastina, Daniel; T., Hackbarth; C., Hague; H., Herzog; K., Hieber; Isella, Giovanni; U., Koenig; B., Roessner; H., Von Kaenel
Electron-electron interaction in p-SiGe/Ge quantum wells
2005-01-01 B., Batlogg; Chrastina, Daniel; Isella, Giovanni; B., Roessner; H., Von Kaenel
Photocurrent and transmission spectroscopy of direct-gap interband transitions in Ge/SiGe quantum wells
2006-01-01 S., Tsujino; H., Sigg; G., Mussler; Chrastina, Daniel; H., VON KAENEL
Hole band nonparabolicity and effective mass measurement in p-SiGe/Ge heterostructures
2006-01-01 B., Roessner; B., Batlogg; H., VON KAENEL; Chrastina, Daniel; Isella, Giovanni
2-D Hole Gas with Two-Subband Occupation in a Strained Ge Channel: Scattering Mechanisms
2006-01-01 Roessner, B.; VON KÄNEL, Hans; Chrastina, Daniel; Isella, Giovanni; Batlogg, B.
Characterization of Ge-on-Si virtual substrates and single junction GaAs solar cells
2006-01-01 R., Ginige; B., Corbett; M., Modreanu; C., Barrett; J., Hilgarth; Isella, Giovanni; Chrastina, Daniel; VON KÄNEL, Hans
Strain-induced shift of phonon modes in Si1-xGex alloys
2006-01-01 F., Pezzoli; E., Grilli; M., Guzzi; S., Sanguinetti; Chrastina, Daniel; Isella, Giovanni; H., VON KAENEL; E., Wintersberger; J., Stangl; G., Bauer
Logic gates with a single Hall bar heterostructure
2006-01-01 Sordan, Roman; Miranda, ALESSIO MASSIMILIA; Osmond, Johann; Chrastina, Daniel; Isella, Giovanni; VON KÄNEL, Hans
Measurement of carrier lifetime and interface recombination velocity in Si-Ge waveguides
2007-01-01 Chrastina, Daniel; I., Cristiani; V., Degiorgio; A., Trita; H., Von Kaenel
Defect analysis of hydrogenated nanocrystalline Si thin films
2007-01-01 A., Cavallini; D., Cavalcoli; M., Rossi; A., Tomasi; S., Pizzini; Chrastina, Daniel; Isella, Giovanni
Effective mass measurement: influence of hole band non parabolicity in SiGe/Ge quantum wells
2007-01-01 B., Batlogg; Chrastina, Daniel; Isella, Giovanni; B., Roessner; H., Von Kaenel
Measurement of lifetime of photo-generated free carriers in SiGe waveguides
2007-01-01 Chrastina, Daniel; I., Cristiani; V., Degiorgio; M., Doebeli; A., Trita; H., Von Kaenel
ESiGe/Si quantum cascade structures deposited by low-energy plasma-enhanced CVD
2008-01-01 Isella, Giovanni; G., Matmon; A., Neels; E., Muller; M., Califano; Chrastina, Daniel; H., VON KANEL; L., Lever; Z., Ikonic; R. W., Kelsall; D. J., Paul
Si/SiGe Bound-to-Continuum Quantum Cascade Emitters
2008-01-01 D. J., Paul; G., Matmon; L., Lever; Z., Ikonic; R., Kelsall; Chrastina, Daniel; Isella, Giovanni; H., VON KÄNEL; E. MÜLLER: A., Neels
Gate-controlled rectifying barrier in a two-dimensional hole gas
2008-01-01 Sordan, Roman; Miranda, ALESSIO MASSIMILIA; Osmond, Johann; D., Colombo; Chrastina, Daniel; Isella, Giovanni; H., VON KÄNEL
Si/SiGe bound-to-continuum quantum cascade terahertz emitters
2008-01-01 D. J., Paul; G., Matmon; L., Lever; Z., Ikoni; R. W., Kelsall; Chrastina, Daniel; Isella, Giovanni; H., VON KÄNEL
Hydrogenated nanocrystalline silicon thin films studied by scanning force microscopy
2008-01-01 D., Cavalcoli; M., Rossi; A., Tomasi; A., Cavallini; Chrastina, Daniel; Isella, Giovanni
Ge/SiGe multiple quantum wells for optical applications
2008-01-01 Chrastina, Daniel; A., Neels; M., Bonfanti; M., Virgilio; Isella, Giovanni; E., Grilli; M., Guzzi; G., Grosso; H., Sigg; H., VON KAENEL
High speed Ge photodetector integrated on silicon-on-insulator operating at very low bias voltage
2008-01-01 Osmond, Johann; Isella, Giovanni; Chrastina, Daniel; R., Kaufmann; H., VON KANEL
An experimental and theoretical investigation of a magnetically confined dc plasma discharge
2008-01-01 Rondanini, Maurizio; Cavallotti, CARLO ALESSANDRO; D., Ricci; Chrastina, Daniel; Isella, Giovanni; Moiseev, Tamara; VON KÄNEL, Hans
Phonon strain shift coefficients in Si1−xGex alloys
2008-01-01 F., Pezzoli; E., Bonera; E., Grilli; M., Guzzi; S., Sanguinetti; Chrastina, Daniel; Isella, Giovanni; H., VON KÄNEL; E., Wintersberger; J., Stangl; G., Bauer
SiGe wet chemical etchants with high compositional selectivity and low strain sensitivity
2008-01-01 M., Stoffel; A., Malachias; T., Merdzhanova; F., Cavallo; Isella, Giovanni; Chrastina, Daniel; H., VON KÄNEL; A., Rastelli; O. G., Schmidt
RAMAN SPECTROSCOPY DETERMINATION OF COMPOSITION AND STRAIN IN SI1-XGEX/SI HETEROSTRUCTURES
2008-01-01 F., Pezzoli; E., Bonera; E., Grilli; M., Guzzi; S., Sanguinetti; Chrastina, Daniel; Isella, Giovanni; H., VON KÄNEL; E., Wintersberger; J., Stangl; G., Bauer
Epitaxial Si-Ge Heterostructures and Nanostructures for Optical and Electrical Applications
2008-01-01 H., VON KÄNEL; M., Bollani; M., Bonfanti; Chrastina, Daniel; D., Colombo; A., Dommann; M., Guzzi; Isella, Giovanni; Miranda, ALESSIO MASSIMILIA; E., Müller; A., Neels; Osmond, Johann; B., Rössner; Sordan, Roman; F., Traversi
Ge/Si (100) heterojunction photodiodes fabricated from material grown by low energy plasma enhanced chemical vapour deposition
2008-01-01 Osmond, Johann; Isella, Giovanni; Chrastina, Daniel; R., Kaufmann; H., VON KÄNEL
Optical transitions in Ge/SiGe multiple quantum wells with Ge-rich barriers
2008-01-01 M., Bonfanti; E., Grilli; M., Guzzi; M., Virgilio; G., Grosso; Chrastina, Daniel; Isella, Giovanni; H., VON KAENEL; A., Neels
Crystallinity and microstructure in Si films grown by plasma-enhanced chemical vapor deposition: A simple atomic-scale model validated by experiments
2009-01-01 P. L., Novikov; A. L., Donne; S., Cereda; L., Miglio; S., Pizzini; S., Binetti; Rondanini, Maurizio; Cavallotti, CARLO ALESSANDRO; Chrastina, Daniel; Moiseev, Tamara; H. v., Kanel; Isella, Giovanni; F., Montalenti
Raman Spectroscopy for the Analysis of Temperature-Dependent Plastic Relaxation of SiGe Layers
2009-01-01 F., Pezzoli; E., Bonera; M., Bollani; S., Sanguinetti; E., Grilli; M., Guzzi; Isella, Giovanni; Chrastina, Daniel; H., Von Kaenel
Langmuir probe plasma parameters and kinetic rates in a Ar-SiH4-H-2 plasma during nc-Si films deposition for photovoltaic applications
2009-01-01 Moiseev, Tamara; Isella, Giovanni; Chrastina, Daniel; Cavallotti, CARLO ALESSANDRO
Vertical arrays of nanofluidic channels fabricated without nanolithography
2009-01-01 Sordan, Roman; Miranda, ALESSIO MASSIMILIA; F., Traversi; D., Colombo; Chrastina, Daniel; Isella, Giovanni; M., Masserini; L., Miglio; K., Kern; K., Balasubramanian
Direct gap related optical transitions in Ge/SiGe quantum wells
2009-01-01 M., Bonfanti; E., Grilli; M., Guzzi; Chrastina, Daniel; Isella, Giovanni; H., von Kaenel; H., Sigg
Polarization-dependent absorption in Ge/SiGe multiple quantum wells
2009-01-01 M., Virgilio; M., Bonfanti; Chrastina, Daniel; A., Neels; Isella, Giovanni; E., Grilli; M., Guzzi; G., Grosso; H., Sigg; H., VON KAENEL
Ultra low dark current Ge/Si photodiodes with low thermal budget
2009-01-01 Osmond, Johann; Isella, Giovanni; Chrastina, Daniel; R., Kaufmann; M., Acciarri; H., Von Kaenel
Threshold ionization mass spectrometry in the presence of excited silane radicals
2009-01-01 Moiseev, Tamara; Chrastina, Daniel; Isella, Giovanni; Cavallotti, CARLO ALESSANDRO
Fabrication of High Efficiency III_V Quantum Nanostructures at Low Thermal Budget on Si
2009-01-01 S., Bietti; Sanguinetti, C. S. o. m. a. s. c. h. i. n. i. S.; N., Kogushi; Isella, Giovanni; Chrastina, Daniel
Raman Spectroscopy for the Analysis οf Temperature Dependent Plastic Relaxation οf SiGe Layers
2009-01-01 F., Pezzoli; E., Bonera; Bollani, Monica; S., Sanguinetti; E., Grilli; M., Guzzi; Isella, Giovanni; Chrastina, Daniel; H., von Känel
Positron annihilation studies of defects in Si1-xGex/SOI heterostructures
2009-01-01 Calloni, Alberto; Ferragut, RAFAEL OMAR; Moia, Fabio; Dupasquier, Alfredo; Isella, Giovanni; D., Marongiu; Norga, GERD JOHAN MARIA; A., Fedorov; Chrastina, Daniel
Plasma Composition and Kinetic Reaction Rates in a LEPECVD Ar-SiH4-H2 Plasma Durign nc-Si Films Deposition for Photovoltaic Applications
2009-01-01 Moiseev, Tamara; Chrastina, Daniel; Isella, Giovanni; Cavallotti, CARLO ALESSANDRO
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