MOISEEV, TAMARA
MOISEEV, TAMARA
DIPARTIMENTO DI CHIMICA, MATERIALI E INGEGNERIA CHIMICA "GIULIO NATTA"
An experimental and theoretical investigation of a magnetically confined dc plasma discharge
2008-01-01 Rondanini, Maurizio; Cavallotti, CARLO ALESSANDRO; D., Ricci; Chrastina, Daniel; Isella, Giovanni; Moiseev, Tamara; VON KÄNEL, Hans
An Investigation Of The Gas Phase And Surface Chemistry Active During The Pecvd Of Nc-Silicon: A Detailed Model Of The Gas Phase And Surface Chemistry
2009-01-01 Cavallotti, CARLO ALESSANDRO; Rondanini, Maurizio; Moiseev, Tamara; Chrastina, Daniel; Isella, Giovanni
Crystallinity and microstructure in Si films grown by plasma-enhanced chemical vapor deposition: A simple atomic-scale model validated by experiments
2009-01-01 P. L., Novikov; A. L., Donne; S., Cereda; L., Miglio; S., Pizzini; S., Binetti; Rondanini, Maurizio; Cavallotti, CARLO ALESSANDRO; Chrastina, Daniel; Moiseev, Tamara; H. v., Kanel; Isella, Giovanni; F., Montalenti
Langmuir probe plasma parameters and kinetic rates in a Ar-SiH4-H-2 plasma during nc-Si films deposition for photovoltaic applications
2009-01-01 Moiseev, Tamara; Isella, Giovanni; Chrastina, Daniel; Cavallotti, CARLO ALESSANDRO
Plasma Composition and Kinetic Reaction Rates in a LEPECVD Ar-SiH4-H2 Plasma Durign nc-Si Films Deposition for Photovoltaic Applications
2009-01-01 Moiseev, Tamara; Chrastina, Daniel; Isella, Giovanni; Cavallotti, CARLO ALESSANDRO
Threshold ionization mass spectrometry in the presence of excited silane radicals
2009-01-01 Moiseev, Tamara; Chrastina, Daniel; Isella, Giovanni; Cavallotti, CARLO ALESSANDRO