RONDANINI, MAURIZIO

RONDANINI, MAURIZIO  

DIPARTIMENTO DI CHIMICA, MATERIALI E INGEGNERIA CHIMICA "GIULIO NATTA"  

Mostra records
Risultati 1 - 7 di 7 (tempo di esecuzione: 0.013 secondi).
Titolo Data di pubblicazione Autori File
A combined fluid dynamics and 3D kinetic monte carlo investigation of the selective deposition of GaAs and InP 1-gen-2004 RONDANINI, MAURIZIOCAVALLOTTI, CARLO ALESSANDROMOSCATELLI, DAVIDEMASI, MAURIZIO +
A multiscale model of the SI CVD process 1-gen-2006 BARBATO, ALESSANDROCAVALLOTTI, CARLO ALESSANDRORONDANINI, MAURIZIO
An experimental and theoretical investigation of a magnetically confined dc plasma discharge 1-gen-2008 RONDANINI, MAURIZIOCAVALLOTTI, CARLO ALESSANDROCHRASTINA, DANIELISELLA, GIOVANNIMOISEEV, TAMARAVON KÄNEL, HANS +
An Investigation Of The Gas Phase And Surface Chemistry Active During The Pecvd Of Nc-Silicon: A Detailed Model Of The Gas Phase And Surface Chemistry 1-gen-2009 CAVALLOTTI, CARLO ALESSANDRORONDANINI, MAURIZIOMOISEEV, TAMARACHRASTINA, DANIELISELLA, GIOVANNI
Crystallinity and microstructure in Si films grown by plasma-enhanced chemical vapor deposition: A simple atomic-scale model validated by experiments 1-gen-2009 RONDANINI, MAURIZIOCAVALLOTTI, CARLO ALESSANDROCHRASTINA, DANIELMOISEEV, TAMARAISELLA, GIOVANNI +
Multiscale investigation of the influence of surface morphology on thin film CVD 1-gen-2007 BARBATO, ALESSANDROFIORUCCI, ALESSANDRORONDANINI, MAURIZIOCAVALLOTTI, CARLO ALESSANDRO
A multiscale model of the plasma assisted deposition of crystalline silicon 1-gen-2007 RONDANINI, MAURIZIOCAVALLOTTI, CARLO ALESSANDRO +