Sfoglia per Autore
Raman Spectroscopy for the Analysis οf Temperature Dependent Plastic Relaxation οf SiGe Layers
2009-01-01 F., Pezzoli; E., Bonera; Bollani, Monica; S., Sanguinetti; E., Grilli; M., Guzzi; Isella, Giovanni; Chrastina, Daniel; H., von Känel
Plasma Composition and Kinetic Reaction Rates in a LEPECVD Ar-SiH4-H2 Plasma Durign nc-Si Films Deposition for Photovoltaic Applications
2009-01-01 Moiseev, Tamara; Chrastina, Daniel; Isella, Giovanni; Cavallotti, CARLO ALESSANDRO
Fabrication of High Efficiency III_V Quantum Nanostructures at Low Thermal Budget on Si
2009-01-01 S., Bietti; Sanguinetti, C. S. o. m. a. s. c. h. i. n. i. S.; N., Kogushi; Isella, Giovanni; Chrastina, Daniel
Ultra low dark current Ge/Si photodiodes with low thermal budget
2009-01-01 Osmond, Johann; Isella, Giovanni; Chrastina, Daniel; R., Kaufmann; M., Acciarri; H., Von Kaenel
An Investigation Of The Gas Phase And Surface Chemistry Active During The Pecvd Of Nc-Silicon: A Detailed Model Of The Gas Phase And Surface Chemistry
2009-01-01 Cavallotti, CARLO ALESSANDRO; Rondanini, Maurizio; Moiseev, Tamara; Chrastina, Daniel; Isella, Giovanni
Crystallinity and microstructure in Si films grown by plasma-enhanced chemical vapor deposition: A simple atomic-scale model validated by experiments
2009-01-01 P. L., Novikov; A. L., Donne; S., Cereda; L., Miglio; S., Pizzini; S., Binetti; Rondanini, Maurizio; Cavallotti, CARLO ALESSANDRO; Chrastina, Daniel; Moiseev, Tamara; H. v., Kanel; Isella, Giovanni; F., Montalenti
Langmuir probe plasma parameters and kinetic rates in a Ar-SiH4-H-2 plasma during nc-Si films deposition for photovoltaic applications
2009-01-01 Moiseev, Tamara; Isella, Giovanni; Chrastina, Daniel; Cavallotti, CARLO ALESSANDRO
Vertical arrays of nanofluidic channels fabricated without nanolithography
2009-01-01 Sordan, Roman; Miranda, ALESSIO MASSIMILIA; F., Traversi; D., Colombo; Chrastina, Daniel; Isella, Giovanni; M., Masserini; L., Miglio; K., Kern; K., Balasubramanian
Direct gap related optical transitions in Ge/SiGe quantum wells
2009-01-01 M., Bonfanti; E., Grilli; M., Guzzi; Chrastina, Daniel; Isella, Giovanni; H., von Kaenel; H., Sigg
Fabrication of GaAs quantum dots by droplet epitaxy on Si/Ge virtual substrate
2009-01-01 S., Bietti; S., Sanguinetti; C., Somaschini; N., Koguchi; Isella, Giovanni; Chrastina, Daniel; A., Fedorov
Impact of misfit dislocations on wavefront distortion in Si/SiGe/Si optical waveguides
2009-01-01 A., Trita; F., Bragheri; I., Cristiani; V., Degiorgio; Chrastina, Daniel; Colombo, Davide; Isella, Giovanni; H., Von Kaenel; F., Gramm; E., Muueller; M., Doebeli
Raman Spectroscopy for the Analysis of Temperature-Dependent Plastic Relaxation of SiGe Layers
2009-01-01 F., Pezzoli; E., Bonera; M., Bollani; S., Sanguinetti; E., Grilli; M., Guzzi; Isella, Giovanni; Chrastina, Daniel; H., Von Kaenel
Threshold ionization mass spectrometry in the presence of excited silane radicals
2009-01-01 Moiseev, Tamara; Chrastina, Daniel; Isella, Giovanni; Cavallotti, CARLO ALESSANDRO
Tuning by means of laser annealing of electronic and structural properties of nc-Si/a-Si:H
2009-01-01 E., Poliani; C., Somaschini; S., Sanguinetti; E., Grilli; M., Guzzi; A., Le Donne; S., Binetti; Chrastina, Daniel; Isella, Giovanni
Ultrafast nonlinear optical response of photoexcited Ge/SiGe quantum wells: Evidence for a femtosecond transient population inversion
2009-01-01 C., Lange; N. S., Koester; S., Chatterjee; H., Sigg; Chrastina, Daniel; Isella, Giovanni; H., Von Kaenel; M., Schaefer; M., Kira; S. W., Koch
Polarization-dependent absorption in Ge/SiGe multiple quantum wells
2009-01-01 M., Virgilio; M., Bonfanti; Chrastina, Daniel; A., Neels; Isella, Giovanni; E., Grilli; M., Guzzi; G., Grosso; H., Sigg; H., VON KAENEL
Transiet optical gain and carrier dynamics in Ge/SiGe quantum wells
2010-01-01 N. S., Koester; C., Lange; S., Chatterjee; H., Sigg; Chrastina, Daniel; Isella, Giovanni; H., von Känel; M., Schäfer; M., Kira; S. W., Koch
Spin polarized photoemission from Ge based heterostructures
2010-01-01 Bottegoni, Federico; A., Ferrari; Marcon, Marco; Isella, Giovanni; Chrastina, Daniel; S., Cecchi; Ciccacci, Franco
Elastic strain relief in a single lithographic SiGe nanostructure by nanobeam X-ray diffraction
2010-01-01 Tagliaferri, Alberto; Chrastina, Daniel; Vanacore, GIOVANNI MARIA; Zani, Maurizio; Bollani, Monica; Schöder, S.; Burghammer, M.; Boye, P.; Isella, Giovanni; Sordan, Roman
Ge/SiGe quantum wells structures for optical modulation
2010-01-01 P., Chaisakul; D., Marris Morini; Isella, Giovanni; Chrastina, Daniel; X., Le Roux; E., Gatti; S., Edmond; Osmond, Johann; E., Cassan; L., Vivien
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