MOISEEV, TAMARA
MOISEEV, TAMARA
DIPARTIMENTO DI CHIMICA, MATERIALI E INGEGNERIA CHIMICA "GIULIO NATTA"
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An Investigation Of The Gas Phase And Surface Chemistry Active During The Pecvd Of Nc-Silicon: A Detailed Model Of The Gas Phase And Surface Chemistry
2009-01-01 Cavallotti, CARLO ALESSANDRO; Rondanini, Maurizio; Moiseev, Tamara; Chrastina, Daniel; Isella, Giovanni
Plasma Composition and Kinetic Reaction Rates in a LEPECVD Ar-SiH4-H2 Plasma Durign nc-Si Films Deposition for Photovoltaic Applications
2009-01-01 Moiseev, Tamara; Chrastina, Daniel; Isella, Giovanni; Cavallotti, CARLO ALESSANDRO