In this work we studied the mechanisms for channel conduction in discrete-trap memories (DTMs). It is shown that the threshold voltage VT in the cell corresponds to a percolation condition in the channel, where the inverted layers connect source to drain. A numerical model is presented which is able to calculate the local profile of VT in the channel, and to evaluate the global VT in the cell according to a channel percolation condition. The model is shown to account for the size dependence of VT in DTM cells, and for the staircase charge-loss characteristics observed on ultrascaled devices. The implications of the percolation mechanism from the reliability point of view are finally discussed in details.

A new channel percolation model for VT shift in discrete-trap memories

IELMINI, DANIELE;MONZIO COMPAGNONI, CHRISTIAN;SOTTOCORNOLA SPINELLI, ALESSANDRO;LACAITA, ANDREA LEONARDO;
2004-01-01

Abstract

In this work we studied the mechanisms for channel conduction in discrete-trap memories (DTMs). It is shown that the threshold voltage VT in the cell corresponds to a percolation condition in the channel, where the inverted layers connect source to drain. A numerical model is presented which is able to calculate the local profile of VT in the channel, and to evaluate the global VT in the cell according to a channel percolation condition. The model is shown to account for the size dependence of VT in DTM cells, and for the staircase charge-loss characteristics observed on ultrascaled devices. The implications of the percolation mechanism from the reliability point of view are finally discussed in details.
2004
Reliability Physics Symposium Proceedings, 2004. 42nd Annual. 2004 IEEE International
9780780383159
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/11311/244930
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