RONDANINI, MAURIZIO
 Distribuzione geografica
Continente #
NA - Nord America 488
EU - Europa 212
AS - Asia 75
SA - Sud America 18
Totale 793
Nazione #
US - Stati Uniti d'America 482
AT - Austria 43
DE - Germania 34
UA - Ucraina 33
SG - Singapore 31
IT - Italia 22
FI - Finlandia 18
CN - Cina 17
BR - Brasile 15
SE - Svezia 14
VN - Vietnam 14
CH - Svizzera 10
ES - Italia 10
GB - Regno Unito 8
FR - Francia 7
CA - Canada 6
IE - Irlanda 5
JO - Giordania 3
AE - Emirati Arabi Uniti 2
BE - Belgio 2
IN - India 2
IR - Iran 2
NL - Olanda 2
RU - Federazione Russa 2
AM - Armenia 1
AR - Argentina 1
AZ - Azerbaigian 1
CO - Colombia 1
EC - Ecuador 1
KG - Kirghizistan 1
LV - Lettonia 1
PL - Polonia 1
SA - Arabia Saudita 1
Totale 793
Città #
Fairfield 57
Ann Arbor 55
Chandler 52
Vienna 42
Ashburn 41
Wilmington 33
Houston 29
Santa Clara 28
Woodbridge 27
Singapore 20
Jacksonville 19
Seattle 19
Cambridge 13
Dearborn 12
Helsinki 11
Bern 10
Málaga 10
Boardman 7
Council Bluffs 7
Dong Ket 7
Lawrence 7
Medford 7
Beijing 6
Ottawa 6
Dublin 5
Milan 4
Amman 3
The Dalles 3
Amsterdam 2
Brooklyn 2
Brussels 2
Columbus 2
Des Moines 2
Falkenstein 2
Fremont 2
Guangzhou 2
North Bergen 2
Norwalk 2
Nürnberg 2
San Diego 2
Simi Valley 2
Al Ain City 1
Angelina 1
Baku 1
Belo Horizonte 1
Bengaluru 1
Bishkek 1
Boston 1
Camaçari 1
Corumbá 1
Curitiba 1
Dubai 1
Düsseldorf 1
Frankfurt am Main 1
Grafenhausen 1
Hlobyne 1
Igarapé 1
Jeddah 1
João Monlevade 1
Juiz de Fora 1
Kunming 1
London 1
Medellín 1
Merlo 1
Mogi Mirim 1
Munich 1
New York 1
Niterói 1
Nova Mutum 1
Novo Hamburgo 1
Portland 1
Recife 1
Riga 1
Shanghai 1
São Paulo 1
Verona 1
Warsaw 1
Warwick 1
Washington 1
Yerevan 1
Totale 605
Nome #
An experimental and theoretical investigation of a magnetically confined dc plasma discharge 159
Crystallinity and microstructure in Si films grown by plasma-enhanced chemical vapor deposition: A simple atomic-scale model validated by experiments 120
A multiscale model of the plasma assisted deposition of crystalline silicon 112
A multiscale model of the SI CVD process 111
Multiscale investigation of the influence of surface morphology on thin film CVD 104
An Investigation Of The Gas Phase And Surface Chemistry Active During The Pecvd Of Nc-Silicon: A Detailed Model Of The Gas Phase And Surface Chemistry 101
A combined fluid dynamics and 3D kinetic monte carlo investigation of the selective deposition of GaAs and InP 90
Totale 797
Categoria #
all - tutte 2.533
article - articoli 1.855
book - libri 0
conference - conferenze 678
curatela - curatele 0
other - altro 0
patent - brevetti 0
selected - selezionate 0
volume - volumi 0
Totale 5.066


Totale Lug Ago Sett Ott Nov Dic Gen Feb Mar Apr Mag Giu
2019/202020 0 0 0 0 0 0 0 0 0 0 17 3
2020/202182 8 1 8 2 10 2 9 8 5 7 4 18
2021/202270 1 18 0 2 11 2 6 4 1 4 6 15
2022/2023123 12 17 2 13 13 13 0 6 17 11 5 14
2023/202447 5 8 3 2 4 10 3 0 1 7 0 4
2024/2025131 0 1 2 13 31 14 2 9 29 7 23 0
Totale 797