Si transistors with deterministically implanted donors were fabricated by single-ion implantation method and their quantum transport was investigated. By placing donors in one dimensional array, we observed the transport characteristics categorized into two regimes: single-electron tunneling through isolated D0 and D- states; Hubbard band formation due to the inter-donor coupling.

Quantum transport in deterministically implanted single-donors in Si FETs

GUAGLIARDO, FILIPPO;FERRARI, GIORGIO;
2011-01-01

Abstract

Si transistors with deterministically implanted donors were fabricated by single-ion implantation method and their quantum transport was investigated. By placing donors in one dimensional array, we observed the transport characteristics categorized into two regimes: single-electron tunneling through isolated D0 and D- states; Hubbard band formation due to the inter-donor coupling.
2011
Electron Devices Meeting (IEDM), 2011 IEEE International
9781457705069
sezele
File in questo prodotto:
Non ci sono file associati a questo prodotto.

I documenti in IRIS sono protetti da copyright e tutti i diritti sono riservati, salvo diversa indicazione.

Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/11311/661974
Citazioni
  • ???jsp.display-item.citation.pmc??? ND
  • Scopus 19
  • ???jsp.display-item.citation.isi??? 7
social impact