The resolution of optical patterning is constrained by the far-field diffraction limit. In this letter, we describe an approach that exploits the unique photo- and electro-chemistry of diarylethene photochromic molecules to overcome this diffraction limit and achieve sub-wavelength nanopatterning.
Subwavelength nano patterning of photochromic diarylethene films
CASTAGNA, ROSSELLA;BERTARELLI, CHIARA;
2012-01-01
Abstract
The resolution of optical patterning is constrained by the far-field diffraction limit. In this letter, we describe an approach that exploits the unique photo- and electro-chemistry of diarylethene photochromic molecules to overcome this diffraction limit and achieve sub-wavelength nanopatterning.File in questo prodotto:
| File | Dimensione | Formato | |
|---|---|---|---|
|
APL2012-Subwavelength nanopatterning.pdf
Accesso riservato
:
Publisher’s version
Dimensione
1.78 MB
Formato
Adobe PDF
|
1.78 MB | Adobe PDF | Visualizza/Apri |
I documenti in IRIS sono protetti da copyright e tutti i diritti sono riservati, salvo diversa indicazione.
