Plasma composition by mass spectroscopy in a Ar-SiH4-H 2 LEPECVD process during nc-Si deposition
Plasma composition by mass spectroscopy in a Ar-SiH4-H 2 LEPECVD process during nc-Si deposition
CHRASTINA, DANIEL;ISELLA, GIOVANNI
2011-01-01
Abstract
Plasma composition by mass spectroscopy in a Ar-SiH4-H 2 LEPECVD process during nc-Si depositionFile in questo prodotto:
Non ci sono file associati a questo prodotto.
I documenti in IRIS sono protetti da copyright e tutti i diritti sono riservati, salvo diversa indicazione.