Plasma composition by mass spectroscopy in a Ar-SiH4-H 2 LEPECVD process during nc-Si deposition

Plasma composition by mass spectroscopy in a Ar-SiH4-H 2 LEPECVD process during nc-Si deposition

CHRASTINA, DANIEL;ISELLA, GIOVANNI
2011-01-01

Abstract

Plasma composition by mass spectroscopy in a Ar-SiH4-H 2 LEPECVD process during nc-Si deposition
Plasma composition by mass spectroscopy in a Ar-SiH4-H 2 LEPECVD process during nc-Si deposition
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/11311/610308
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