Production of polysilicon plays a key role in the development of hi-tech and renewable energy industry. Massive production is obtained by chemical vapor deposition (CVD) in semi-batch reactors, traditionally called Siemens reactors, where silicon rods are grown. Following recent increase in market demand for polysilicon, a fine process control on industrial processes for improving production yield and reducing energy consumption is required. In this work, a technique for a real-time model-based predictive control applied to a laboratory-scale Siemens reactor is presented; a lumped model is used for describing the CVD process. Discussion is based on numerical results.

Model Predictive Control of a CVD Reactor for Production of Polysilicon Rods

MANENTI, FLAVIO;
2010-01-01

Abstract

Production of polysilicon plays a key role in the development of hi-tech and renewable energy industry. Massive production is obtained by chemical vapor deposition (CVD) in semi-batch reactors, traditionally called Siemens reactors, where silicon rods are grown. Following recent increase in market demand for polysilicon, a fine process control on industrial processes for improving production yield and reducing energy consumption is required. In this work, a technique for a real-time model-based predictive control applied to a laboratory-scale Siemens reactor is presented; a lumped model is used for describing the CVD process. Discussion is based on numerical results.
2010
PRES 2010: 13TH INTERNATIONAL CONFERENCE ON PROCESS INTEGRATION, MODELLING AND OPTIMISATION FOR ENERGY SAVING AND POLLUTION REDUCTION
978-88-95608-05-1
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/11311/579682
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