Influence of Magnetic Fields on Autocatalytic Deposition of Co-Fe Thin Films

In the present paper, the effect of magnetic fields 17–98 mT on the autocatalytic deposition of Co1−x–Fex 35–42 atom % thin films is addressed. The deposition kinetics was strongly related to field intensity. Low magnetic fields 17 mT increased the deposition rate by a factor of 2, whereas high magnetic fields above 76 mT completely inhibited the deposition process after a few minutes from the beginning of the reaction. Alloy composition was also affected by the application of magnetic fields. Depending on the intensity of the applied field, the Fe content in the alloy gradually changed from 36 to 41 atom % below 200 nm and from 42 to 37 atom % above 200 nm of thickness. On average, the application of magnetic fields during the deposition process increased the coercivity of thin Co–Fe films and made them anisotropic, with the extent of such an effect depending on film thickness.