We report on the direct observation of backscattering induced by sidewall roughness in high-index-contrast optical waveguides based on total internal reflection. Our results demonstrate that backscattering is one of the most severe limiting factors in state-of-the art silicon on insulator nanowires employed in densely integrated photonics. We also derive the general relationship between backscattering and geometrical and optical parameters of the waveguide. Further, the role of roughness in polarization rotation and coupling with higher-order modes is pointed out.

Roughness induced backscattering in optical silicon waveguides

MORICHETTI, FRANCESCO;CANCIAMILLA, ANTONIO;FERRARI, CARLO;TORREGIANI, MATTEO ALDO;MELLONI, ANDREA IVANO;MARTINELLI, MARIO
2010-01-01

Abstract

We report on the direct observation of backscattering induced by sidewall roughness in high-index-contrast optical waveguides based on total internal reflection. Our results demonstrate that backscattering is one of the most severe limiting factors in state-of-the art silicon on insulator nanowires employed in densely integrated photonics. We also derive the general relationship between backscattering and geometrical and optical parameters of the waveguide. Further, the role of roughness in polarization rotation and coupling with higher-order modes is pointed out.
2010
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/11311/570163
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