Among silver oxides, Ag4O4, i.e. high valence Ag(I)Ag(III) oxide, is interesting for applications in high energy batteries and for the development of antimicrobial coatings.Wehere show that ns UV pulsed laser deposition (PLD) in an oxygen containing atmosphere allows the synthesis of pure Ag4O4 nanocrystalline thin films, permitting at the same time to control the morphology of the material at the sub-micrometer scale. Ag4O4 films with a crystalline domain size of the order of tens of nm can be deposited provided the deposition pressure is above a threshold (roughly 4 Pa pure O2 or 20 Pa synthetic air). The formation of this particular high valence silver oxide is explained in terms of the reactions occurring during the expansion of the ablated species in the reactive atmosphere. In particular, expansion of the PLD plasma plume is accompanied by formation of low stability Ag–O dimers and atomic oxygen, providing reactive species at the substrate where the film grows. Evidence of reactive collisions in the expanding ablation plume is obtained by analysis of the plume visible shape in inert and reactive atmospheres. In addition, we show how the dimensionless deposition parameter L, relating the target-to-substrate distance to the ablation plume maximum expansion length, can be used to classify different growth regimes. It is thus possible to vary the stoichiometry and themorphology of the films, from compact and columnar to foamlike, by controlling both the gas pressure and the target-to-substrate distance.

Nanostructured high valence silver oxide produced by pulsed laser deposition

DELLASEGA, DAVID;FACIBENI, ANNA;DI FONZO, FABIO;RUSSO, VALERIA;CASARI, CARLO SPARTACO;LI BASSI, ANDREA;BOTTANI, CARLO ENRICO
2009

Abstract

Among silver oxides, Ag4O4, i.e. high valence Ag(I)Ag(III) oxide, is interesting for applications in high energy batteries and for the development of antimicrobial coatings.Wehere show that ns UV pulsed laser deposition (PLD) in an oxygen containing atmosphere allows the synthesis of pure Ag4O4 nanocrystalline thin films, permitting at the same time to control the morphology of the material at the sub-micrometer scale. Ag4O4 films with a crystalline domain size of the order of tens of nm can be deposited provided the deposition pressure is above a threshold (roughly 4 Pa pure O2 or 20 Pa synthetic air). The formation of this particular high valence silver oxide is explained in terms of the reactions occurring during the expansion of the ablated species in the reactive atmosphere. In particular, expansion of the PLD plasma plume is accompanied by formation of low stability Ag–O dimers and atomic oxygen, providing reactive species at the substrate where the film grows. Evidence of reactive collisions in the expanding ablation plume is obtained by analysis of the plume visible shape in inert and reactive atmospheres. In addition, we show how the dimensionless deposition parameter L, relating the target-to-substrate distance to the ablation plume maximum expansion length, can be used to classify different growth regimes. It is thus possible to vary the stoichiometry and themorphology of the films, from compact and columnar to foamlike, by controlling both the gas pressure and the target-to-substrate distance.
PLD Silver oxide Thin films Antibacterial Nanostructured
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Utilizza questo identificativo per citare o creare un link a questo documento: http://hdl.handle.net/11311/544524
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