Most MEMS devices involving contacting surfaces suffer from stiction and wear. While the development of self-assembled monolayer (SAM)-based processes has virtually eliminated stiction, wear remains a serious reliability issue. In this paper, the use of titania ultrathin films as a means to reduce both stiction and wear is reported. Atomic layer deposition (ALD) is used for the film growth in order to ensure a uniform and conformal coating, effectively encapsulating the released polysilicon microelectromechanical systems (MEMS) devices. The application of 10-nm thin titania coating is shown to result in improved reliability of test microdevices. To further improve reliability, a vapor phase SAM coating is applied to TiO2 encapsulated micromachines. Results on the tribological properties of both TiO2and SAM coated TiO2-encapsulated microdevices are presented.

Nanometer-thin titania films with SAM-level stiction and superior wear resistance for reliable MEMS performance

MAGAGNIN, LUCA;
2004-01-01

Abstract

Most MEMS devices involving contacting surfaces suffer from stiction and wear. While the development of self-assembled monolayer (SAM)-based processes has virtually eliminated stiction, wear remains a serious reliability issue. In this paper, the use of titania ultrathin films as a means to reduce both stiction and wear is reported. Atomic layer deposition (ALD) is used for the film growth in order to ensure a uniform and conformal coating, effectively encapsulating the released polysilicon microelectromechanical systems (MEMS) devices. The application of 10-nm thin titania coating is shown to result in improved reliability of test microdevices. To further improve reliability, a vapor phase SAM coating is applied to TiO2 encapsulated micromachines. Results on the tribological properties of both TiO2and SAM coated TiO2-encapsulated microdevices are presented.
17th IEEE International Conference on Micro Electro Mechanical Systems: Maastricht: Mems 2004 Technical Digest: January 25-29, 2004
9780780382657
Atomic layer deposition (ALD), Conformal coatings, Microgears
File in questo prodotto:
File Dimensione Formato  
NANOMETER-THIN TITANIA FILMS-2.pdf

Accesso riservato

: Altro materiale allegato
Dimensione 1.46 MB
Formato Adobe PDF
1.46 MB Adobe PDF   Visualizza/Apri

I documenti in IRIS sono protetti da copyright e tutti i diritti sono riservati, salvo diversa indicazione.

Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/11311/271316
Citazioni
  • ???jsp.display-item.citation.pmc??? ND
  • Scopus 14
  • ???jsp.display-item.citation.isi??? ND
social impact