Integration of samarium-cobalt hard magnets on silicon requires buffer/protective layers that can enhance the magnetic properties of the magnet while preserving its structure and chemical composition after post-annealing treatments needed for the formation of the magnetically hard phase. In this work, a comparison of samarium-cobalt films for five different buffer/protective layers, namely, Ti, W, TiW, Ta, and Cr, and two different annealing temperatures, 650 °C and 750 °C, is presented. Depending on materials and annealing temperatures, magnetic properties such as saturation and coercivity of the SmCo film can be finely tuned. We show that coercivity up to 3.65 T or saturation magnetization up to 0.95 T can be reached by proper choice of the relevant process parameters: deposition temperature, material for the buffer/protective layer, and annealing temperature. Such value of coercivity is among the highest found in the literature for thin films of SmCo.

Influence of Buffer/Protective Layers on the Structural and Magnetic Properties of SmCo Films on Silicon

Maspero, F.;Koplak, O.;Plaza, A.;Bertacco, R.
2024-01-01

Abstract

Integration of samarium-cobalt hard magnets on silicon requires buffer/protective layers that can enhance the magnetic properties of the magnet while preserving its structure and chemical composition after post-annealing treatments needed for the formation of the magnetically hard phase. In this work, a comparison of samarium-cobalt films for five different buffer/protective layers, namely, Ti, W, TiW, Ta, and Cr, and two different annealing temperatures, 650 °C and 750 °C, is presented. Depending on materials and annealing temperatures, magnetic properties such as saturation and coercivity of the SmCo film can be finely tuned. We show that coercivity up to 3.65 T or saturation magnetization up to 0.95 T can be reached by proper choice of the relevant process parameters: deposition temperature, material for the buffer/protective layer, and annealing temperature. Such value of coercivity is among the highest found in the literature for thin films of SmCo.
2024
Micro-electromechanical system (MEMS)
permanent magnet
SmCo
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/11311/1301946
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