Dielectric metasurfaces sustain electromagnetic modes which can be exploited to enhance nonlinear frequency-conversion processes such as third-harmonic generation. In this work we employ electron-beam lithography to fabricate silicon metasurfaces supporting electromagnetic resonances with different quality factors (Q), ruled by the geometry. This allows to investigate the trade-off between resonant enhancement and matching the spectral bandwidth of the ultrafast excitation source. Both experiments and simulations indicate that higher values of Q do not a priori bring about a stronger third-harmonic generation, which correlates to the spectral overlap between the metasurface resonance and the pump bandwidth.

Silicon metasurfaces with tunable electromagnetic resonances for nonlinear optical conversion

Fagiani L.;Zilli A.;de Angelis C.;Finazzi M.;Celebrano M.;Bollani M.
2021-01-01

Abstract

Dielectric metasurfaces sustain electromagnetic modes which can be exploited to enhance nonlinear frequency-conversion processes such as third-harmonic generation. In this work we employ electron-beam lithography to fabricate silicon metasurfaces supporting electromagnetic resonances with different quality factors (Q), ruled by the geometry. This allows to investigate the trade-off between resonant enhancement and matching the spectral bandwidth of the ultrafast excitation source. Both experiments and simulations indicate that higher values of Q do not a priori bring about a stronger third-harmonic generation, which correlates to the spectral overlap between the metasurface resonance and the pump bandwidth.
2021
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/11311/1208352
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