Memristive devices including resistive random access memory (RRAM) cells are promising nanoscale low-power components projected to facilitate significant improvement in power and speed of Deep Learning (DL) accelerators, if structured in crossbar architectures. However, these devices possess non-ideal endurance and retention properties, which should be modeled efficiently. In this paper, we propose a novel generalized empirical metal-oxide RRAM endurance and retention model for use in large-scale DL simulations. To the best of our knowledge, the proposed model is the first to unify retention-endurance modeling while taking into account time, energy, SET-RESET cycles, device size, and temperature. We compare the model to state-of-the-art and demonstrate its versatility by applying it to experimental data from fabricated devices. Furthermore, we use the model for CIFAR-10 dataset classification using a large-scale deep memristive neural network (DMNN) implementing the MobileNetV2 architecture. Our results show that, even when ignoring other device non-idealities, retention and endurance losses significantly affect the performance of DL networks. Our proposed model and its DL simulations are made publicly available.

Empirical metal-oxide RRAM device endurance and retention model for deep learning simulations

Ielmini D.
2021

Abstract

Memristive devices including resistive random access memory (RRAM) cells are promising nanoscale low-power components projected to facilitate significant improvement in power and speed of Deep Learning (DL) accelerators, if structured in crossbar architectures. However, these devices possess non-ideal endurance and retention properties, which should be modeled efficiently. In this paper, we propose a novel generalized empirical metal-oxide RRAM endurance and retention model for use in large-scale DL simulations. To the best of our knowledge, the proposed model is the first to unify retention-endurance modeling while taking into account time, energy, SET-RESET cycles, device size, and temperature. We compare the model to state-of-the-art and demonstrate its versatility by applying it to experimental data from fabricated devices. Furthermore, we use the model for CIFAR-10 dataset classification using a large-scale deep memristive neural network (DMNN) implementing the MobileNetV2 architecture. Our results show that, even when ignoring other device non-idealities, retention and endurance losses significantly affect the performance of DL networks. Our proposed model and its DL simulations are made publicly available.
SEMICONDUCTOR SCIENCE AND TECHNOLOGY
Deep learning
Endurance
Metal-oxide RRAM
Retention
Simulation
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Utilizza questo identificativo per citare o creare un link a questo documento: http://hdl.handle.net/11311/1173655
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