Heavily doped Ge thin films grown on different substrates have been investigated by infrared (IR) reflectometry. Screened plasma frequency and losses have been determined to assess the possibilities and limitations of Ge for mid infrared plasmonic.
Heavily phosphorous-doped Germanium thin films for mid-infrared plasmonics
Frigerio, J.;Isella, G.;Biagioni, P.;
2015-01-01
Abstract
Heavily doped Ge thin films grown on different substrates have been investigated by infrared (IR) reflectometry. Screened plasma frequency and losses have been determined to assess the possibilities and limitations of Ge for mid infrared plasmonic.File in questo prodotto:
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