Micron-thick boron films have been deposited by Pulsed Laser Deposition in vacuum on several substrates at room temperature. The use of high energy pulses (> 700 mJ) results in the deposition of smooth coatings with low oxygen uptake even at base pressures of 10^- 4 - 10^-3 Pa. A detailed structural analysis, by X-Ray Diffraction and Raman, allowed to assess the amorphous nature of the deposited films as well as to determine the base pressure that prevents boron oxide formation. In addition the crystallization dynamics has been characterized showing that film crystallinity already improves at relatively low temperatures (800 °C). Elastic properties of the boron films have been determined by Brillouin Spectroscopy. Finally, micro-hardness tests have been used to explore cohesion and hardness of B films deposited on aluminum, silicon and alumina. The reported deposition strategy allows the growth of reliable boron coatings paving the way for their use in many technology fields.

Boron films produced by high energy Pulsed Laser Deposition

DELLASEGA, DAVID;RUSSO, VALERIA;LECIS, NORA FRANCESCA MARIA;BESOZZI, EDOARDO;BEGHI, MARCO;BOTTANI, CARLO ENRICO;PASSONI, MATTEO
2017

Abstract

Micron-thick boron films have been deposited by Pulsed Laser Deposition in vacuum on several substrates at room temperature. The use of high energy pulses (> 700 mJ) results in the deposition of smooth coatings with low oxygen uptake even at base pressures of 10^- 4 - 10^-3 Pa. A detailed structural analysis, by X-Ray Diffraction and Raman, allowed to assess the amorphous nature of the deposited films as well as to determine the base pressure that prevents boron oxide formation. In addition the crystallization dynamics has been characterized showing that film crystallinity already improves at relatively low temperatures (800 °C). Elastic properties of the boron films have been determined by Brillouin Spectroscopy. Finally, micro-hardness tests have been used to explore cohesion and hardness of B films deposited on aluminum, silicon and alumina. The reported deposition strategy allows the growth of reliable boron coatings paving the way for their use in many technology fields.
Boron coatings; Brillouin Spectroscopy; Micro-hardness; Pulsed Laser Deposition; Raman Spectroscopy; Materials Science (all); Mechanics of Materials; Mechanical Engineering
File in questo prodotto:
File Dimensione Formato  
Dellasega_Mat&Des17_B films by PLD.pdf

Accesso riservato

: Publisher’s version
Dimensione 2.48 MB
Formato Adobe PDF
2.48 MB Adobe PDF   Visualizza/Apri
Dellasega_Boron films_postprint.pdf

embargo fino al 11/08/2019

: Post-Print (DRAFT o Author’s Accepted Manuscript-AAM)
Dimensione 2.02 MB
Formato Adobe PDF
2.02 MB Adobe PDF Visualizza/Apri

I documenti in IRIS sono protetti da copyright e tutti i diritti sono riservati, salvo diversa indicazione.

Utilizza questo identificativo per citare o creare un link a questo documento: http://hdl.handle.net/11311/1034409
Citazioni
  • ???jsp.display-item.citation.pmc??? ND
  • Scopus 24
  • ???jsp.display-item.citation.isi??? 23
social impact