The LAMP (Lightweight Asymmetry and Magnetism Probe) X-ray telescope is a mission concept to measure the polarization of X-ray astronomical sources at 250 eV via imaging mirrors that reflect at incidence angles near the polarization angle, i.e., 45 deg. Hence, it will require the adoption of multilayer coatings with a few nanometers dspacing in order to enhance the reflectivity. The nickel electroforming technology has already been successfully used to fabricate the high angular resolution imaging mirrors of the X-ray telescopes SAX, XMM-Newton, and Swift/XRT. We are investigating this consolidated technology as a possible technique to manufacture focusing mirrors for LAMP. Although the very good reflectivity performances of this kind of mirrors were already demonstrated in grazing incidence, the reflectivity and the scattering properties have not been tested directly at the unusually large angle of 45 deg. Other possible substrates are represented by thin glass foils or silicon wafers. In this paper we present the results of the X-ray reflectivity campaign performed at the BEAR beamline of Elettra - Sincrotrone Trieste on multilayer coatings of various composition (Cr/C, Co/C), deposited with different sputtering parameters on nickel, silicon, and glass substrates, using polarized X-rays in the spectral range 240 - 290 eV.

Testing multilayer-coated polarizing mirrors for the LAMP soft X-ray telescope

TAYABALY, KASHMIRA CHRISTELLE;
2015-01-01

Abstract

The LAMP (Lightweight Asymmetry and Magnetism Probe) X-ray telescope is a mission concept to measure the polarization of X-ray astronomical sources at 250 eV via imaging mirrors that reflect at incidence angles near the polarization angle, i.e., 45 deg. Hence, it will require the adoption of multilayer coatings with a few nanometers dspacing in order to enhance the reflectivity. The nickel electroforming technology has already been successfully used to fabricate the high angular resolution imaging mirrors of the X-ray telescopes SAX, XMM-Newton, and Swift/XRT. We are investigating this consolidated technology as a possible technique to manufacture focusing mirrors for LAMP. Although the very good reflectivity performances of this kind of mirrors were already demonstrated in grazing incidence, the reflectivity and the scattering properties have not been tested directly at the unusually large angle of 45 deg. Other possible substrates are represented by thin glass foils or silicon wafers. In this paper we present the results of the X-ray reflectivity campaign performed at the BEAR beamline of Elettra - Sincrotrone Trieste on multilayer coatings of various composition (Cr/C, Co/C), deposited with different sputtering parameters on nickel, silicon, and glass substrates, using polarized X-rays in the spectral range 240 - 290 eV.
2015
Optics for EUV, X-Ray, and Gamma-Ray Astronomy VII
9781628417692
Brewster angle; LAMP; multilayer mirrors; X-ray mirrors; X-ray polarimetry; Electronic, Optical and Magnetic Materials; Condensed Matter Physics; Computer Science Applications1707 Computer Vision and Pattern Recognition; Applied Mathematics; Electrical and Electronic Engineering
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/11311/1026554
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