Computational modeling of UV-initiated advanced oxidation processes in a cross-flow photoreactor

A computational fluid dynamics (CFD) modeling study of different advanced oxidation processes (AOPs) in a UV photoreactor with a cross-flow lamp arrangement is presented in this paper. In particular, the verification and validation of three different AOP-CFD models: UV185, UV254+H2O2, and UV185+UV254+H2O2, developed in a Eulerian framework, is introduced and discussed. The AOP model was developed by coupling a comprehensive kinetic model with advanced optical models and detailed hydraulics. Oxalic acid (OXA) was chosen as model pollutant for the assessment of the AOP performance. Results revealed that the efficacy of the UV185/UV254/H2O2 process, at laminar flowrates, is superior to the other treatment processes in terms of oxalic acid degradation.