A sparse combined generalized polynomial chaos model is proposed to characterize the impact of fabrication process variations in photonic circuits and perform design optimization. Simulations on a realistic example confirm the effectiveness of the technique.
Generalized polynomial chaos expansion for photonic circuits optimization
MELATI, DANIELE;MELLONI, ANDREA IVANO
2016-01-01
Abstract
A sparse combined generalized polynomial chaos model is proposed to characterize the impact of fabrication process variations in photonic circuits and perform design optimization. Simulations on a realistic example confirm the effectiveness of the technique.File in questo prodotto:
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